Nowadays best smartphone processors are putting to work over 10 billion transistors for users able to stream data and interact on various media platforms at unprecedented speeds. While nanofabrication technologies below 5 nm are facing critical challenges, the horizontal propagation of semiconductor devices in our daily life (smart homes, bio-medical sensors, transportation and communication, generically quoted as Internet of Things) is predicted to significantly increase in the near future and consequently open a vast business potential. A high diversity of low cost sensors and devices are to be designed and fabricated using micro- and nanotechnologies that need to be adapted to this new context. The aim of this project is to use state-of-the-art concepts on 3D plasma-aided nanofabrication as to design novel equipment and establish the needed processing steps for thin film deposition, etching and implantation on substrates/wafers above 200 mm in diameter, with special focus on metal oxide and nitride semiconductors. The project involves DTU Nanolab at Technical University of Denmark, Poyteknik A/S, a Danish industrial partner producing nanofabrication equipment, and PragmatIC, an UK company already active on low-cost semiconductor device fabrication.